Engineered for high-precision optics and demanding performance, this optical-grade HPFS (High Purity Fused Silica) wafer measures 200.00 mm ± 0.10 mm in diameter and 3.00 mm –0.10 mm in thickness. With a large 180 mm clear aperture, it offers a substantial usable area for applications requiring wide, distortion-free optical access. The wafer is polished to deliver a transmitted wavefront error of 0.05 waves PV over any 25 mm diameter region, while reflective surfaces are held to ≤ 0.10 waves PV for S1, and ≤ 1 wave PV for S2 over the same area. Parallelism is held to ≤ 5 arc seconds. The surface cosmetic quality is 60/40 scratch-dig; edge finish is fine-edge ground. This piece delivers reliable optical flatness and high fidelity over large area surfaces in a durable, thick format.